STUDYING OF THERMAL ANNEALING EFFECT ON STRUCTURALAND OPTICAL PROPERTIES OF CU2O THIN FILMS PREPARED BYPLASMA SPUTTERING METHOD

Authors

  • A. Sangery Department of plasma, office of chemistry &materials physics, Ministry of science and technology. Baghdad – Iraq.
  • A. Sebber Department of plasma, office of chemistry &materials physics, Ministry of science and technology. Baghdad – Iraq.
  • A. Dawood Department of plasma, office of chemistry &materials physics, Ministry of science and technology. Baghdad – Iraq.
  • S. Abbas Department of plasma, office of chemistry &materials physics, Ministry of science and technology. Baghdad – Iraq.
  • H. Khalaf Department of plasma, office of chemistry &materials physics, Ministry of science and technology. Baghdad – Iraq.

DOI:

https://doi.org/10.24996/ijs.2011.52.4.%25g

Keywords:

PYRETHRINS, Chrysanthemumcinerariaefolium

Abstract

In this study we prepare Cu2O films by using plasma sputtering method on
substrate from glass type Pyrex; we used system of dipole sputtering with magnetic
field. We studied the optical and structural properties to Cu2O and we studied
thermal annealing with 150◦C on optical and structural properties for prepared thin
films with thickness 2000Ǻ for one hour. It showed that the thermal annealing leads
to increase of optical energy gap. We used x-rays diffraction for diagnostic structure
and nature thin film material. the results appear that the thin film is poly crystalline
structure, the thermal annealing leads to drop of diffraction peaks and increase it
edges that's means it become more uniformity as well as it consist of optical
properties study about spectrum record for absorbance and transmission for the
prepared thin films in visible region and ultraviolet for range of wave length 300-
900 nm.

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Published

2024-06-12

Issue

Section

Biotechnology

How to Cite

STUDYING OF THERMAL ANNEALING EFFECT ON STRUCTURALAND OPTICAL PROPERTIES OF CU2O THIN FILMS PREPARED BYPLASMA SPUTTERING METHOD. (2024). Iraqi Journal of Science, 52(4), 464-469. https://doi.org/10.24996/ijs.2011.52.4.%g