Characterization Study of Neodymium Doped Tin Oxide Films for Optoelectronic Applications




tin oxide nanoparticles, spray paralysis preparation, optical properties, photoconductive, photoconductive gain


Tin chloride of 1M concentration was used as the precursor, and neodymium chloride was used as a dopant (with different doping ratios) to create pure and neodymium (Nd) doped tin oxide (SnO2) thin films with varied doping ratios (1, 3 and 5) wt%. Using UV-visible absorbance and XRD patterns, it was possible to analyze the impact of Nd doping ratio on the optical and structural characteristics of the produced thin films. All samples have a polycrystalline structure that is identical to the conventional SnO2 peaks, according to XRD measurements. As the doping ratio rises, the crystallinity falls. At doping ratio of 5wt%, a new phase emerged for Nd2O3. According to optical characteristics, the transmittance rises with doping ratio, from 4.13% to 35.76% at 550 nm. The optical band gap increases from 3.60 to 4.20eV with an increase in Nd content from 0 to 5%, and the energy gap was a direct transition. I-V properties for all samples are examined in dark and light conditions. Photocurrent and dark current increases with increasing doping ratio. The produced films have shown increase in photoconductivity gain.


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How to Cite

Characterization Study of Neodymium Doped Tin Oxide Films for Optoelectronic Applications. (2024). Iraqi Journal of Science, 65(5), 2479-2489.

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