Electrical Properties and Optimum Conditions of A Home-Made Magnetron Plasma Sputtering System

Sarah Ahmed  Hassan; Ahmed Abed  Anber; Eidan Asi  Abdullah; Jafer Fahdel  Odah; Najwa J.  Jubier; Ali Adnan  Abd Alwahab

doi:10.24996/ijs.2021.62.11(SI).16

Authors

Sarah Ahmed Hassan Essaouira Education Directorate, Ministry of Education, Wasit, Iraq
Ahmed Abed Anber Department of Renewable energy Science, College of Energy and Environment Science, AL Karkh University of Science, Baghdad, Iraq
Eidan Asi Abdullah Department of Physics, College of Science, University of Wasit, Wasit, Iraq
Jafer Fahdel Odah Department of Medical Physics, College of Science, AL-Karkh University of Science, Baghdad, Iraq
Najwa J. Jubier Department of Physics, College of Science, University of Wasit, Wasit, Iraq
Ali Adnan Abd Alwahab Wasit Education Directorate, Ministry of Education, Wasit, Iraq

DOI:

https://doi.org/10.24996/ijs.2021.62.11(SI).16

Keywords:

I-V characteristics, Paschen's curve, Sputtering, Sputtering magnetron

Abstract

In this work, the electrical properties and optimum conditions of the plasma sputtering system have been studied. The electrical properties such as Paschen's curve, current-voltage, current pressure relations, the strength of magnetic field as a function of inter-electrode distance, the influence of gas working pressure and argon-oxygen ratio on the electrical characterization were studied to determine the basic optimum condition of the system operation. the discharge current as a function of discharge voltage showed high discharge current at 2.5 cm. These parameters represent the basic conditions to operate any plasma sputtering system which are the right behavior to build up and design the discharge an electrode. The ideal conditions of these homemade systems were qualified to prepare the various nanostructure thin films. The two electrodes were made of copper because of its good conductivity, and to avoid the power dissipation inside discharge chamber.